Special Papers
Low Temperature Polysilicon Technology for Advanced Display Systems
Tolis Voutsas
Abstract
In this paper I review research and development in the area of low temperature
polysilicon (p-Si) formation for application in advanced display systems. A
brief introduction to the scope of these efforts and the market for this
technology is given, followed by a presentation of the methods that are being
developed to meet these objectives. The technical merits and demerits of various
approaches for low-temperature p-Si formation are reviewed on the basis of
current studies, and an attempt is made to extrapolate trends and suggest
solutions for the technical difficulties that currently plague the development
of a manufacturing-compatible process.